Sequential Doping of Ladder-Type Conjugated Polymers for Thermally Stable n-Type Organic Conductors
Abstract
Doping of organic semiconductors is a powerful tool to optimize the performance of various organic (opto)electronic and bioelectronic devices. Despite recent advances, the low thermal stability of the electronic properties of doped polymers still represents a significant obstacle to implementing these materials into practical applications. Hence, the development of conducting doped polymers with excellent long-term stability at elevated temperatures is highly desirable. Here, we report on the sequential doping of the ladder-type polymer poly-(benzimidazobenzophenanthroline) (BBL) with a benzimidazole-based dopant (i.e., N-DMBI). By combining electrical, UV-vis/infrared, X-ray diffraction, and electron paramagnetic resonance measurements, we quantitatively characterized the conductivity, Seebeck coefficient, spin density, and microstructure of the sequentially doped polymer films as a function of the thermal annealing temperature. Importantly, we observed that the electrical conductivity of N-DMBI-doped BBL remains unchanged even after 20 h of heating at 190 degrees C. This finding is remarkable and of particular interest for organic thermoelectrics. ; Funding Agencies|Swedish Research CouncilSwedish Research Council [2016-03979]; AForsk [18-313, 19310]; Olle Engkvists Stiftelse [204-0256]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [2009 00971]; Finnish Cultural FoundationFinnish Cultural Foundation; Finnish Foundation for Technology Promotion; Knut and Alice Wallenberg FoundationKnut & Alice Wallenberg Foundation; Knut and Alice Wallenberg FoundationKnut & Alice Wallenberg Foundation [Dnr KAW 2014.0041]
Themen
Sprachen
Englisch
Verlag
Linköpings universitet, Laboratoriet för organisk elektronik; Linköpings universitet, Tekniska fakulteten; Linköpings universitet, Elektroniska och fotoniska material; Linköpings universitet, Ytors Fysik och Kemi; Chalmers Univ Technol, Sweden; SLAC Natl Accelerator Lab, CA 94025 USA
DOI
Problem melden